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Internship - gas flow control

Praktikum
VAT Group AG
Inserat online seit: Veröffentlicht vor 14 Std.
Beschreibung

Internship – Advanced Gas Flow Control (100%) We at VAT Group AG, headquartered in Switzerland, invite a both talented and passionate Internship candidate to join our Corporate R&D BU - one of our most valued Business Units. The manufacturing of a high-end microchip requires over 1000 production steps. Vacuum valves and gas flow control devices are critical components as they are in proximity to the semiconductor wafer and impact the process performance. Semiconductor fabs like Intel, Samsung or TSMC have increasing expectations for productivity and production yield. Technological advancements in the semiconductor industry and scaling to nano-meter structures require a high precision control of process gases during production. You will collaborate with Lab Development Engineers on lab initiatives, with the opportunity to manage your own projects and tasks independently. WHAT WE OFFER Join a global leader at the forefront of semiconductor innovation, we are a globally leading company in the semiconductor industry A technologically advanced and innovative working environment with Modern Laboratory and testing facilities Thrive in a collaborative, innovative environment that celebrates bold ideas and outstanding execution — where your potential knows no bounds Enjoy an exceptional working environment with great amenities at our VAT Group offices in the Swiss canton of St. Gallen Receive competitive compensation and benefits aligned with your expertise and contributions YOUR CHALLENGES * Contribute to the development of high-performance vacuum valves and gas flow control devices critical for semiconductor wafer processing. * Support semiconductor fabs (e.g., Intel, Samsung, TSMC) in meeting increasing productivity and yield expectations. * Analyze and leverage manufacturing process data to enhance production performance. * Help design smart, connected vacuum components enabling predictive maintenance and improved performance in semiconductor fabs. * Tackle chall...

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